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This measurement provides oxide thickness and chromium enrichment information throughout the passivated region
SEMI C69-1224 (technical revision)
This test may also be applied to semiconductor materials other than silicon and to insulators other than silicon dioxide
This Guide supports the approach by off-line measurement of the contaminants using best available techniques available in the laboratory setting
white light confocal microscopy
P04400 - SEMI P44 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools StdPbc-0526 This measurement provides oxide thicknessThis Standard defines the common mask data format specifications based on OASIS for mask tools, namely OASIS. MASK. OASIS. MASK specification applies to the input data format for mask tools. Referenced SEMI Standards (purchase separately) SEMI P39 Specification for OASIS Open Artwork System Interchange Standard Revision History SEMI P44 1216 (Reapproved 0124) SEMI P44 1216 (technical revision) SEMI P44 0316 (technical revision) SEMI P44 0211
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